Quick Takeaways
  • Mitsubishi Electric SiC MOSFET boosts EV efficiency with 50% lower losses
  • Mitsubishi Electric SiC MOSFET samples enable high-performance traction inverters
On January 14, Mitsubishi Electric Corporation announced the development of new Mitsubishi Electric SiC MOSFET trench-type power semiconductor chips designed specifically for electric vehicles. The company confirmed that four sample variants will begin shipping from January 21, marking a key step toward more energy-efficient EV traction systems.
These advanced chips are engineered to keep traction motor performance high while cutting electrical losses, a critical factor in extending driving range and improving overall vehicle efficiency. By integrating the Mitsubishi Electric SiC MOSFET directly into traction motor system inverters, automakers can achieve higher power density with lower heat generation.
How Mitsubishi Electric SiC MOSFET trench design improves efficiency
Trench-type SiC-MOSFETs use a structure where microscopic grooves are etched into the wafer surface, and the gate electrodes are embedded inside these trenches. This architecture differs from conventional planar designs, where the gate sits on the surface of the wafer.
With the Mitsubishi Electric SiC MOSFET trench structure, current flow is controlled more efficiently, which significantly reduces electrical resistance during operation. As a result, less energy is wasted as heat when the inverter switches power to the traction motor.
Key advantages of the trench-type SiC-MOSFET design
  • Grooves etched into the wafer increase effective channel area
  • Embedded gate electrodes improve switching behavior
  • Lower on-resistance compared to planar SiC-MOSFETs
  • Better suitability for compact EV inverter layouts

According to Mitsubishi Electric, this trench-type approach enables up to 50 percent lower power loss compared with planar SiC-MOSFETs, making it especially attractive for high-voltage, high-current EV applications.
Stable quality through Mitsubishi Electric’s proprietary gate oxide process
A major challenge with high-performance SiC power devices is maintaining consistent electrical characteristics across large production volumes. Mitsubishi Electric addressed this by applying its own gate oxide film manufacturing technology to the new Mitsubishi Electric SiC MOSFET chips.
This proprietary process suppresses variations in on-resistance and other key electrical parameters. By stabilizing these factors, the company can deliver more uniform device performance, which is essential for automotive-grade reliability in traction motor system inverters.
What the January 21 sample shipments mean for EV developers
The shipment of four different sample types from January 21 allows EV and inverter manufacturers to begin evaluating the Mitsubishi Electric SiC MOSFET in real-world powertrain designs. These samples are intended for integration testing, thermal performance studies, and system-level efficiency benchmarking.
For automakers and Tier-1 suppliers, this early access can accelerate the development of next-generation EV inverters that are smaller, lighter, and more energy-efficient while still delivering strong traction motor output.
By combining trench-type SiC-MOSFET architecture with stable gate oxide technology, Mitsubishi Electric is positioning its new power chips as a key building block for the next wave of high-efficiency electric vehicle platforms.
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